Justice Served: Two Convicted for Orchestrating 2019 DusitD2 Terror Attack

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The DusitD2 attack struck a symbolic blow in Westlands, targeting civilians and employees in a lavish venue. Scores were left injured .

Kahawa Law Courts sentence two men to 30 years each for facilitating the 2019 DusitD2 terror attack in Nairobi. Photo/DCI.

By Robert Assad

The Kahawa Law Courts sentenced Hussein Mohamed Abdille Ali and Mohamed Abdi Ali to 30 years’ imprisonment each for facilitating the deadly 2019 attack on Kenya’s prestigious DusitD2 complex in Nairobi.

Both men were convicted last month on charges of conspiracy to commit an act of terrorism and multiple counts of facilitation, including financing and providing fake identification documents to the al‑Shabab militants who carried out the siege .

During sentencing, Judge Diana Mochache (also referred to as Kavedza) emphasized that without their logistical support, the attackers could not have executed their plan.

The attack, claimed by the al‑Qaeda‑linked group al‑Shabab, devastated the upscale complex in January 2019. It lasted over 12 hours, resulting in the deaths of 21 people, including foreign nationals, before Kenyan security forces neutralized all five attackers.

Judge Mochache described the sentencing as critical for survivors and families seeking closure, noting that it reflects “one of the most comprehensive counter-terrorism investigations in Kenya’s history” .

She underscored the severity of support roles to terrorism: “Without financiers, facilitators and sympathisers, terrorists cannot actualise their activities.” 

Background & Impact

The DusitD2 attack struck a symbolic blow in Westlands, targeting civilians and employees in a lavish venue. Scores were left injured .

Abdille, aged 22, and Ali, aged 61, provided critical logistical support — from money transfers to false IDs that aided attacker movement .

The case built on a conviction in May where both men were found guilty, following testimony from 45 witnesses, including victims and security personnel .

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